Apparatus and methods for multi-step chemical mechanical...

Details Apparatus and methods for multi-step chemical mechanical... Apparatus and methods for multi-step chemical mechanical...

2005-05-03

2005-05-03

Rose, Robert A. (Department: 3723)

Abrading

Abrading process

Combined abrading

C451S041000

Reexamination Certificate

active

06887136

ABSTRACT:
A chemical mechanical polishing apparatus has a rotatable platen, a generally linear polishing sheet having an exposed portion extending over a top surface of the platen for polishing the substrate, and a drive mechanism to incrementally advance the polishing sheet in a linear direction across a top surface of the platen. The polishing sheet is releasably secured to the platen to rotate with the platen, and it has a width greater than a diameter of the substrate.

REFERENCES:
patent: 5335453 (1994-08-01), Baldy et al.
patent: 5897426 (1999-04-01), Somekh
patent: 5989107 (1999-11-01), Shimizu et al.
patent: 6068542 (2000-05-01), Hosokai
patent: 6244935 (2001-06-01), Birang et al.

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