Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1986-02-24
1989-07-11
Howell, Janice A.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504921, 250423R, H01J 3700, H01J 2700
Patent
active
048475041
ABSTRACT:
A system for implanting ions into a target element including a source arrangement for producing an ion beam; a beam analyzing arrangement for receiving the ion beam and selectively separating various ion species in the beam on the basis of mass to produce an analyzed beam; and a beam resolving arrangement disposed in the path of the analyzed beam for permitting a preselected ion species to pass to the target element. The analyzing arrangement has an ion dispersion plane associated therewith. The source arrangement has an associated ion emitting envelope including an area of substantial extension in a plane parallel to the ion dispersion plane and producing ions entering said analyzing arrangement which are travelling substantially either toward or from a common apparent line object lying in a plane perpendicular to the ion dispersion plane.
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Applied Materials Inc.
Aronoff Michael
Howell Janice A.
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