Apparatus and methods for ion implantation

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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2504921, 250423R, H01J 3700, H01J 2700

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active

048475041

ABSTRACT:
A system for implanting ions into a target element including a source arrangement for producing an ion beam; a beam analyzing arrangement for receiving the ion beam and selectively separating various ion species in the beam on the basis of mass to produce an analyzed beam; and a beam resolving arrangement disposed in the path of the analyzed beam for permitting a preselected ion species to pass to the target element. The analyzing arrangement has an ion dispersion plane associated therewith. The source arrangement has an associated ion emitting envelope including an area of substantial extension in a plane parallel to the ion dispersion plane and producing ions entering said analyzing arrangement which are travelling substantially either toward or from a common apparent line object lying in a plane perpendicular to the ion dispersion plane.

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patent: 3705320 (1972-12-01), Freeman
patent: 4017403 (1977-04-01), Freeman
patent: 4118630 (1978-10-01), McKenna et al.
patent: 4316090 (1982-02-01), Sakudo et al.
patent: 4345113 (1982-10-01), Goode et al.
patent: 4612440 (1986-09-01), Brunee et al.

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