Apparatus and methods for chemical vapor deposition

Details Apparatus and methods for chemical vapor deposition Apparatus and methods for chemical vapor deposition

2011-06-28

2011-06-28

Zervigon, Rudy (Department: 1716)

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

C118S7230VE, C156S345100

Reexamination Certificate

active

07967911

ABSTRACT:
Methods and apparatus are disclosed for the formation of vaporizing liquid precursor materials. The methods or apparatus can be used as part of a chemical vapor deposition apparatus or system, for example for forming films on substrates. The methods and apparatus involve providing a vessel for containing a liquid precursor and diffusing element having external cross-section dimensions substantially equal to the internal cross-sectional dimensions of the vessel.

REFERENCES:
patent: 4232063 (1980-11-01), Rosler et al.
patent: 4496609 (1985-01-01), McNeilly et al.
patent: 4579080 (1986-04-01), Martin et al.
patent: 4668365 (1987-05-01), Foster et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5037624 (1991-08-01), Tom et al.
patent: 2004/0016404 (2004-01-01), Gregg et al.
patent: 2006/0219177 (2006-10-01), Brcka
patent: 1548813 (2005-06-01), None
patent: 60-131973 (1985-07-01), None
IPRP of Oct. 14, 2008 for PCT/US2007/066366, 10 pp.
Timmons, M. et al., “A study of cylinder design for solid OMVPE sources”,Journal of Crystal Growth, Elsevier vol. 221, No. 1-4 (200-12), Amsterdam, NL, (Dec. 2000) 635-639 pp.
“PCT International Search Report”, (Nov. 4, 2007), PCT/US07/066366.

Affiliated with

Also associated with

Rating

Apparatus and methods for chemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and methods for chemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and methods for chemical vapor deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2638888