Apparatus and method using a remote RF energized plasma for...

Details Apparatus and method using a remote RF energized plasma for... Apparatus and method using a remote RF energized plasma for...

2006-04-25

2006-04-25

Norton, Nadine G. (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S711000, C438S712000, C438S715000, C438S729000, C438S730000

Reexamination Certificate

active

07033952

ABSTRACT:
Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radicals to form the chemical species at the point of use.

REFERENCES:
patent: 3622493 (1971-11-01), Crusco
patent: 3625846 (1971-12-01), Murdoch et al.
patent: 3652434 (1972-03-01), Bar-Nun et al.
patent: 3657107 (1972-04-01), Herriman et al.
patent: 3658673 (1972-04-01), Kugler et al.
patent: 3869616 (1975-03-01), Smars et al.
patent: 3919397 (1975-11-01), Gould
patent: 3938988 (1976-02-01), Othmer
patent: 3954954 (1976-05-01), Davis et al.
patent: 4145403 (1979-03-01), Fey et al.
patent: 4266113 (1981-05-01), Denton et al.
patent: 4351810 (1982-09-01), Martinez et al.
patent: 4390405 (1983-06-01), Hahn et al.
patent: 4482525 (1984-11-01), Chen
patent: 4512868 (1985-04-01), Fujimura et al.
patent: 4739147 (1988-04-01), Meyer et al.
patent: 4766287 (1988-08-01), Morrisroe et al.
patent: 4771015 (1988-09-01), Kanai et al.
patent: 4794230 (1988-12-01), Seliskar et al.
patent: 4812201 (1989-03-01), Sakai et al.
patent: 4812326 (1989-03-01), Tsukazaki et al.
patent: 4849192 (1989-07-01), Lyon
patent: 4883570 (1989-11-01), Efthimion et al.
patent: 4898748 (1990-02-01), Kruger et al.
patent: 4926001 (1990-05-01), Alagy et al.
patent: 4973773 (1990-11-01), Malone
patent: 5012065 (1991-04-01), Rayson et al.
patent: 5026464 (1991-06-01), Mizuno et al.
patent: 5051557 (1991-09-01), Satzger
patent: 5200595 (1993-04-01), Boulos et al.
patent: 5338399 (1994-08-01), Yanagida
patent: 5403434 (1995-04-01), Moslehi
patent: 5403630 (1995-04-01), Matsui et al.
patent: 5427669 (1995-06-01), Drummond
patent: 5531973 (1996-07-01), Sarv
patent: 5535906 (1996-07-01), Drummond
patent: 5560844 (1996-10-01), Boulos et al.
patent: 5599425 (1997-02-01), Lagendijk et al.
patent: 5607602 (1997-03-01), Su et al.
patent: 5620559 (1997-04-01), Kikuchi
patent: 5652021 (1997-07-01), Hunt et al.
patent: 5665640 (1997-09-01), Foster et al.
patent: 5684581 (1997-11-01), French et al.
patent: 5747935 (1998-05-01), Porter et al.
patent: 5756402 (1998-05-01), Jimbo et al.
patent: 5770099 (1998-06-01), Rice et al.
patent: 5827370 (1998-10-01), Gu
patent: 5853602 (1998-12-01), Shoji
patent: 5877471 (1999-03-01), Huhn et al.
patent: 5908566 (1999-06-01), Saltzer
patent: 5917286 (1999-06-01), Scholl et al.
patent: 5935334 (1999-08-01), Fong et al.
patent: 5939886 (1999-08-01), Turner et al.
patent: 5980999 (1999-11-01), Goto et al.
patent: 6007879 (1999-12-01), Scholl
patent: 6029602 (2000-02-01), Bhatnagar
patent: 6046546 (2000-04-01), Porter et al.
patent: 6053123 (2000-04-01), Xia
patent: 6066568 (2000-05-01), Kawai et al.
patent: 6156667 (2000-12-01), Jewett
patent: 6163006 (2000-12-01), Doughty et al.
patent: 6183605 (2001-02-01), Schatz et al.
patent: 6194036 (2001-02-01), Babayan et al.
patent: 6197119 (2001-03-01), Dozoretz et al.
patent: 6217717 (2001-04-01), Drummond et al.
patent: 6222321 (2001-04-01), Scholl et al.
patent: 6225592 (2001-05-01), Doughty
patent: 6238514 (2001-05-01), Gu
patent: 6251792 (2001-06-01), Collins et al.
patent: 6291938 (2001-09-01), Jewett et al.
patent: 6352049 (2002-03-01), Yin et al.
patent: 6368477 (2002-04-01), Scholl
patent: 6384540 (2002-05-01), Porter, Jr. et al.
patent: 6410880 (2002-06-01), Putvinski et al.
patent: 6432260 (2002-08-01), Mahoney et al.
patent: 6488745 (2002-12-01), Gu
patent: 6494957 (2002-12-01), Suzuki
patent: 6521099 (2003-02-01), Drummond et al.
patent: 6521792 (2003-02-01), Akteries et al.
patent: 6544896 (2003-04-01), Xu et al.
patent: 6633017 (2003-10-01), Drummond et al.
patent: 2002/0134244 (2002-09-01), Gu
patent: 2003/0077402 (2003-04-01), Amann et al.
patent: 56 102577 (1981-08-01), None
patent: 5 275392 (1993-10-01), None
patent: 6 295907 (1994-10-01), None
patent: 7 106593 (1995-04-01), None
patent: 10 098038 (1998-04-01), None
patent: WO 91/17285 (1991-11-01), None
European Search Report.

Affiliated with

Also associated with

Rating

Apparatus and method using a remote RF energized plasma for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method using a remote RF energized plasma for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method using a remote RF energized plasma for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3550788