Apparatus and method of producing a negative ion plasma

Details Apparatus and method of producing a negative ion plasma Apparatus and method of producing a negative ion plasma

1997-11-12

2000-04-18

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

438729, 438732, 118723I, 118723IR, 156345, H05H 100

Patent

active

060511516

ABSTRACT:
An apparatus and method of producing a negative ion plasma for use in manufacturing of microelectronic devices, particularly etching of microelectronic patterns in semiconductor wafers. A negative ion plasma is produced from a hot electron plasma formed by a RF or UHF plasma source. The negative ion plasma includes positive ions, negative ions and relatively cold electrons, such electrons having an effective electron temperature or average energies less than that for maintaining the plasma. The fields producing the hot plasma are isolated from the negative ion plasma in a cold plasma region by a magnetic filter. The magnetic filter confines the plasmas to provide plasma uniformity at a work piece being etched by the negative ion plasma. The magnetic filter further prevents hot electrons originating in the hot electron plasma from diffusing into the negative ion plasma, while allowing positive ions and cold electrons to diffuse from the hot plasma to the negative ion plasma. An RF bias on the work piece accelerates the positive ions, electrons and/or negative ions to the work piece being etched.

REFERENCES:
patent: 4842707 (1989-06-01), Kinoshita
patent: 5444207 (1995-08-01), Sekine et al.
patent: 5556521 (1996-09-01), Ghanbari
O. Fukuma et al..; "Relationship Between Extraction of H-Ions Optimized by Plasma Grid Potential & Plasma Parameters in a Bucket Source"; Rev. Sci. Instrum. 63 (4); Apr., 1992; pp. 2696-2698.
M. Hanada et al.; "114cm X 36cm vol. Negative Ion Source Producing Multi-Ampere Ion Beams"; Rev. Sci. Instrum. 61 (1), Jan., 1990; pp. 499-501.
Y. Yoshida; "Reduction of Charge-Up Damage in Magnetron RIE"; Electrochemical Society Proceedings; vol. 95-5; pp. 236-245.

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