Apparatus and method of forming a photoresist pattern, and...

Details Apparatus and method of forming a photoresist pattern, and... Apparatus and method of forming a photoresist pattern, and...

2004-10-06

2008-11-04

Huff, Mark F (Department: 1795)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S108000, C700S109000, C700S110000, C700S120000

Reexamination Certificate

active

07447559

ABSTRACT:
In an apparatus and a method of forming a photoresist pattern, a photoresist-coating section coats a substrate with a photoresist composition to form a photoresist film. A light is irradiated onto the photoresist film by using an exposure section, and a developing section develops the photoresist film. A residue-sensing section senses a residue of the developed photoresist film to generate information of the residue corresponding to the sensed residue. A residue-removing section sprays a solvent in a region of the residue corresponding to the information of the residue to dissolve the residue, and the residue-removing section absorbs the residue dissolved by the solvent. Therefore, the residue is effectively removed by spraying the solvent in the region of the residue and absorbing the residue dissolved by the solvent.

REFERENCES:
patent: 5844662 (1998-12-01), Akimoto et al.
patent: 2001/0004066 (2001-06-01), Toshima et al.
patent: 2003/0016349 (2003-01-01), Tsumura et al.
patent: 04-106949 (1992-04-01), None
patent: 2003089929 (2003-11-01), None
JP 04-106949, English Machine Translation, Abstract Only.

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