Apparatus and method for washing substrates

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 18, 134902, 15 211, 15 881, 15 882, B08B 704, B08B 1100

Patent

active

054982944

ABSTRACT:
A substrates-cleaning apparatus including a first unit provided with a scrubber for scrubbing a single side of a substrate, a second unit provided with a turning mechanism for turning the substrate upside down or vice versa, and a carrier robot for carrying the substrate between the first and the second unit.

REFERENCES:
patent: 5081733 (1992-01-01), Kudo
patent: 5092011 (1992-03-01), Gommori et al.
patent: 5144711 (1992-09-01), Gill, Jr.
patent: 5278821 (1994-01-01), Kawamura et al.
patent: 5282289 (1994-02-01), Hasegawa et al.
patent: 5345639 (1994-09-01), Tanoue et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for washing substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for washing substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for washing substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2097922

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.