Apparatus and method for utilizing a meniscus in substrate...

Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor

Reexamination Certificate

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C034S092000

Reexamination Certificate

active

07093375

ABSTRACT:
An apparatus for processing a substrate is provided which includes a proximity head proximate to a surface of the substrate when in operation. The apparatus also includes an opening on a surface of the proximity head to a cavity defined in the proximity head where the cavity delivers an active agent to the surface of the substrate through the opening. The apparatus further includes a plurality of conduits on the surface of the proximity head that generates a fluid meniscus on the surface of the substrate surrounding the opening.

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