Apparatus and method for supporting, positioning and...

Coating apparatus – Gas or vapor deposition – Work support

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C141S082000, C406S088000

Reexamination Certificate

active

08057601

ABSTRACT:
An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing.

REFERENCES:
patent: 3982627 (1976-09-01), Isohata
patent: 4495024 (1985-01-01), Bok
patent: 4544446 (1985-10-01), Cady
patent: 4681776 (1987-07-01), Bok
patent: 4738748 (1988-04-01), Kisa
patent: 4922853 (1990-05-01), Hofer
patent: 5194406 (1993-03-01), Bok et al.
patent: 5226383 (1993-07-01), Bhat
patent: 5248380 (1993-09-01), Tanaka
patent: 5489341 (1996-02-01), Bergman et al.
patent: 5584310 (1996-12-01), Bergman et al.
patent: 5761023 (1998-06-01), Lue et al.
patent: 5997963 (1999-12-01), Davison et al.
patent: 6001175 (1999-12-01), Maruyama et al.
patent: 6005226 (1999-12-01), Aschner et al.
patent: 6099056 (2000-08-01), Siniaguine et al.
patent: 6102057 (2000-08-01), Vogtmann et al.
patent: 6113702 (2000-09-01), Halpin et al.
patent: 6183565 (2001-02-01), Granneman et al.
patent: 6239038 (2001-05-01), Wen
patent: 6343183 (2002-01-01), Halpin et al.
patent: 6402843 (2002-06-01), Siniaguine et al.
patent: 6454865 (2002-09-01), Goodman et al.
patent: 6454866 (2002-09-01), Halpin et al.
patent: 6491757 (2002-12-01), Halpin et al.
patent: 6505635 (2003-01-01), Vogtmann et al.
patent: 6692576 (2004-02-01), Halpin et al.
patent: 6720263 (2004-04-01), Olgado et al.
patent: 6839507 (2005-01-01), Adams et al.
patent: 7312156 (2007-12-01), Granneman et al.
patent: 7351293 (2008-04-01), Kuznetsov et al.
patent: 7604439 (2009-10-01), Yassour et al.
patent: 2001/0018276 (2001-08-01), Suzuki
patent: 2001/0051499 (2001-12-01), Shinozaki
patent: 2002/0179589 (2002-12-01), Morita et al.
patent: 2003/0168174 (2003-09-01), Foree
patent: 2005/0091992 (2005-05-01), Aggarwal et al.
patent: 2005/0126605 (2005-06-01), Yassour et al.
patent: 2005/0145180 (2005-07-01), Aggarwal et al.
International Search Report and Written Opinion dated Sep. 7, 2009 for International Application No. PCT/US2009/030996. (APPM/011194PCTP02).
International Search Report and Written Opinion of the International Searching Authority dated Aug. 22, 2008 (PCT/US08/63105; 011194PCT).
CoreFlow: “Thermal Platforms”, http://www.coreflow.com/page.asp?cat=140&type=2&lang=1, Jan. 28, 2008.
CoreFlow: “From Technology to Solution”, http://www.coreflow.com/page.asp?cat=79&type=2&lang=1, Feb. 14, 2008.
CoreFlow: “Smart Nozzles”, http://www.coreflow.com/page.asp?cat=113&type=2&lang=1, Feb. 14, 2008.
CoreFlow: “Handling”, http://aop.co.il/customers/core/page.asp?cat=66&lang=1&type=2, Jan. 28, 2008.
CoreFlow: “XY(Z) Accurate Platforms”, http://aop.co.il/customers/core/page.asp?cat=138&type=2&lang=1, Jan. 28, 2008.
CoreFlow: “Coating”, http://aop.co.il/customers/core/page.asp?cat=65&lang=1&type=2, Jan. 28, 2008.
ASM International N.V.: Products—“Levitor”, http://asm.com/index.php?option=com—content&task=view&id=13&Itemid=52, Jan. 28, 2008.
Kuznetsov et al., “LEVITOR 4000: An Advanced RTP System Based on Conductive Heat Transfer,” 197th Meeting of The Electrochemical Society—Toronto, Ontario, Canada May 14-18, 2000, pp. 1-10.
Granneman et al., “Fast-Ramp, Low-Temperature, Annealing in the LEVITOR Floating Wafer System,” Rapid Thermal and Other Short-Term Proc. Technol. II, 199th ECS meeting, Washington DC, Mar. 26-29, 2001, pp. 1-9.
Granneman et al., “The LEVITOR 4000 System, Ultra-fast, Emissivity-independent, Heating of Substrates Via Heat Conduction Through Thin Gas Layers,” RTP-2001 Mie, Japan, Nov. 2001, pp. 1-6.
CoreFlow: Thermal Processs—http://www.coreflow.com, Jul. 25, 2007.
Tru-Si Technologies. No Touch Handling—http://www.trusi.com
otouchhandling.html, Jul. 25, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for supporting, positioning and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for supporting, positioning and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for supporting, positioning and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4290364

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.