Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2008-01-21
2011-11-15
Huson, Gregory (Department: 3751)
Coating apparatus
Gas or vapor deposition
Work support
C118S728000, C141S065000, C406S088000
Reexamination Certificate
active
08057602
ABSTRACT:
Embodiments of the invention contemplate a method, apparatus and system that are used to support, position, and rotate a substrate during processing. Embodiments of the invention may also include a method of controlling the transfer of heat between a substrate and substrate support positioned in a processing chamber. The apparatus and methods described herein remove the need for complex, costly and often unreliable components that would be required to accurately position and rotate a substrate during one or more processing steps, such as an rapid thermal processing (RTP) process, a chemical vapor deposition (CVD) process, a physical vapor deposition (PVD) process, atomic layer deposition (ALD) process, dry etching process, wet clean, and/or laser annealing process.
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Koelmel Blake
Lerner Alexander N.
Ranish Joseph M.
Sangam Kedarnath
Sorabji Khurshed
Applied Materials Inc.
Huson Gregory
Niesz Jason
Patterson & Sheridan L.L.P.
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