Apparatus and method for supplying chemicals

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S691000, C438S692000, C438S693000

Reexamination Certificate

active

11062593

ABSTRACT:
A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a precessing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.

REFERENCES:
patent: 2803441 (1957-08-01), Stewart et al.
patent: 3948490 (1976-04-01), Troope
patent: 4059929 (1977-11-01), Bishop
patent: 4242841 (1981-01-01), Ushakov et al.
patent: 4580699 (1986-04-01), Black et al.
patent: 5148945 (1992-09-01), Geatz
patent: 5409310 (1995-04-01), Owczarz
patent: 5502685 (1996-03-01), Orlando
patent: 5722447 (1998-03-01), Morgan et al.
patent: 5750440 (1998-05-01), Vanell et al.
patent: 5800056 (1998-09-01), Suzuki et al.
patent: 5803599 (1998-09-01), Ferri, Jr. et al.
patent: 5868278 (1999-02-01), Chen
patent: 5964231 (1999-10-01), Kight et al.
patent: 6040245 (2000-03-01), Sandhu et al.
patent: 6059920 (2000-05-01), Nojo et al.
patent: 6274504 (2001-08-01), Sanderfer et al.
patent: 63-88029 (1988-04-01), None
patent: 1-128829 (1989-09-01), None
patent: 5-251423 (1993-09-01), None
patent: 9-29637 (1997-02-01), None
patent: 9-139334 (1997-05-01), None
patent: 9-290368 (1997-11-01), None
patent: 96/02319 (1996-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for supplying chemicals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for supplying chemicals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for supplying chemicals will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3788491

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.