Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate
2007-04-24
2007-04-24
Deo, Duy-Vu N. (Department: 1765)
Semiconductor device manufacturing: process
Chemical etching
Combined with the removal of material by nonchemical means
C438S691000, C438S692000, C438S693000
Reexamination Certificate
active
11062593
ABSTRACT:
A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a precessing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
REFERENCES:
patent: 2803441 (1957-08-01), Stewart et al.
patent: 3948490 (1976-04-01), Troope
patent: 4059929 (1977-11-01), Bishop
patent: 4242841 (1981-01-01), Ushakov et al.
patent: 4580699 (1986-04-01), Black et al.
patent: 5148945 (1992-09-01), Geatz
patent: 5409310 (1995-04-01), Owczarz
patent: 5502685 (1996-03-01), Orlando
patent: 5722447 (1998-03-01), Morgan et al.
patent: 5750440 (1998-05-01), Vanell et al.
patent: 5800056 (1998-09-01), Suzuki et al.
patent: 5803599 (1998-09-01), Ferri, Jr. et al.
patent: 5868278 (1999-02-01), Chen
patent: 5964231 (1999-10-01), Kight et al.
patent: 6040245 (2000-03-01), Sandhu et al.
patent: 6059920 (2000-05-01), Nojo et al.
patent: 6274504 (2001-08-01), Sanderfer et al.
patent: 63-88029 (1988-04-01), None
patent: 1-128829 (1989-09-01), None
patent: 5-251423 (1993-09-01), None
patent: 9-29637 (1997-02-01), None
patent: 9-139334 (1997-05-01), None
patent: 9-290368 (1997-11-01), None
patent: 96/02319 (1996-02-01), None
Armstrong Kratz Quintos Hanson & Brooks, LLP
Deo Duy-Vu N.
Fujitsu Limited
LandOfFree
Apparatus and method for supplying chemicals does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for supplying chemicals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for supplying chemicals will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3788491