Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-09-23
1998-11-03
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 20419216, 2041922, 20419222, 20419223, 20429808, 20429811, 20429826, C23C 1434, C23C 1435
Patent
active
058303316
ABSTRACT:
A hydrogenated carbon film for magnetic thin film recording media is manufactured by alternating current magnetron sputtering in an atmosphere containing argon and a hydrocarbon gas. Targets mounted side-by-side cyclically sputter and discharge charge buildup according to an alternating current. Shielding between the targets directs electrons toward the anode at a given time.
REFERENCES:
patent: 4737419 (1988-04-01), Hilden et al.
patent: 4778582 (1988-10-01), Howard
patent: 5074983 (1991-12-01), Eltoukhy et al.
patent: 5415757 (1995-05-01), Szcyrbowski et al.
patent: 5507930 (1996-04-01), Yamashita et al.
patent: 5512164 (1996-04-01), Timberlake
patent: 5558751 (1996-09-01), Mahler et al.
"Deposition of Si.sub.3 N.sub.4 with Twinmag Sputtering Cathode", Leybold's Electronics Newsletter, No. 5, Jan. 1994, pp. 14-17.
Scherer, M., et al., "Reactive Alternating Current Magnetron Sputtering of Dielectric Layers", J. Vac. Sci. Technol. A 10(4), Jul./Aug. 1992, pp. 1772-1776.
Este, G., et al., "A Quasi-Direct Current Sputtering Technique for the Deposition of Dielectrics at Enhanced Rates", J. Vac. Sci. Technol. A 6(3), May/Jun. 1988, pp. 1845-1848.
Scholl, R.A., "Process Improvements for Sputtering Carbon and Other Difficult Materials Using Combined AC and DC Process Power", Society of Vacuum Coaters, 35th Annual Technical Conference Proceedings (1992), 1-878068-11-2, pp. 391-392.
Marchon, B., et al., "Structure and Mechanical Properties of Hydrogenated Carbon Films Prepared by Magnetron Sputtering", Center for Advanced Materials, Lawrence Berkely Laboratory, Berkeley, CA.
Dimigen, H., et al., "Tribologial and Electrical Properties of Metal-Containing Hydrogenated Carbon Films", Appl. Phys. Ltr. 50 (16), 20 Apr. 1987, pp. 1056-1058.
Cho, N-H., et al., "Chemical Structure and Physical Properties of Diamond-Like Amorphous Carbon Films Prepared by Magnetron Sputtering", J. Mater, Res., vol. 5, No. 11, Nov. 1990.
Tsai, Hsiao-chu, et al., "Critical Review: Characterization of Diamondlike Carbon Films and Their Application as Overcoats on Thin Film Media for Magnetic Recording", J. Vac. Sci. Technol., A, vol. 5, No. 6, pp. 3267-3312 Nov./Dec. 1987.
Bruno John C.
Hollars Dennis R.
Kim Taesun E.
Lee Hyung J.
Shih Yao-Tzung R.
Seagate Technology Inc.
Weisstuch Aaron
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