Apparatus and method for shielding a wafer holder

Details Apparatus and method for shielding a wafer holder Apparatus and method for shielding a wafer holder

1998-04-06

2000-02-29

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429809, 118504, 118725, C23C 1434

Patent

active

060305096

ABSTRACT:
The present invention provides a wafer holder shield in a physical vapor deposition chamber for use in a metal deposition process without the arcing problem. The shield is constructed in a configuration of a toroid wherein the toroid has a rectangular cross-section and a flat bottom surface. The toroid further has a cavity at the center adapted for receiving a wafer when the shield is placed on a wafer holder. The flat bottom surface of the wafer holder shield has an inner end adjacent to an inner periphery of the toroid that is supported by the wafer holder. The flat bottom surface further has an outer end adjacent to an outer periphery of the toroid suspended over and spaced apart from a chamber shield for the deposition chamber at a distance sufficient to prevent bridge formation between the wafer holder shield and the chamber shield by metal particles generated in the deposition chamber.

REFERENCES:
patent: 5096536 (1992-03-01), Cathey, Jr.
patent: 5725740 (1998-03-01), Raaijmakers
patent: 5736021 (1998-04-01), Ding et al.
patent: 5810931 (1998-09-01), Stevens et al.
patent: 5843520 (1998-12-01), Liu
patent: 5873983 (1999-02-01), Liu

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