Electric resistance heating devices – Heating devices – Radiant heater
Patent
1995-02-03
1999-11-09
Pelham, Joseph
Electric resistance heating devices
Heating devices
Radiant heater
219390, 118725, 118730, C23C 1600, H02N 1300, F27D 1102, H01L 21324
Patent
active
059829869
ABSTRACT:
A semiconductor processing apparatus and process is capable of degassing a semiconductor substrate and also orienting the substrate in the same vacuum chamber. The apparatus includes an electrostatic clamping structure for retaining the entire undersurface of a semiconductor substrate in thermal communication therewith in the vacuum chamber, a heater located within the electrostatic clamping structure for heating the electrostatically clamped substrate to degas it, a rotation mechanism for imparting rotation to the substrate in the vacuum chamber, and a detector for detecting the rotational alignment of the substrate in response to the rotation of the substrate. In a preferred embodiment, the substrate is rotated to rotationally align it as it is being heated to degas it.
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patent: 4771730 (1988-09-01), Tezuka
patent: 5113102 (1992-05-01), Gilmore
patent: 5324540 (1994-06-01), Terada
patent: 5382803 (1995-01-01), Asakawa
patent: 5421893 (1995-06-01), Perlov
patent: 5444217 (1995-08-01), Moore et al.
patent: 5566043 (1996-10-01), Kawada et al.
Applied Materials Inc.
Pelham Joseph
Taylor John P.
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