Apparatus and method for removing metallic contamination from fl

Details Apparatus and method for removing metallic contamination from fl Apparatus and method for removing metallic contamination from fl

1991-11-29

1992-11-17

Dawson, Robert A.

Liquid purification or separation

Processes

Ion exchange or selective sorption

134902, 210167, 2105021, 210807, 210912, 437939, H01L 21306, B01D 3906

Patent

active

051640937

ABSTRACT:
A method and apparatus is provided for removing metallic contamination from a fluid or liquid that passes through a recirculating system (10) that is used for cleaning and etching semiconductor wafers. A bath 11) and fluid is provided. A recirculared fluid flows through a silicon media, thereby removing the metallic contamination from the liquid. In a preferred embodiment, the silicon media is a plurality of silicon or polysilicon beads which provide a maximum surface area in a minimum of space. Additionally, removal of metallic contamination from the recirculating fluid is combined with particle filtration of the recirculating fluid single housing.

REFERENCES:
patent: 2892240 (1959-06-01), Frankenhoff
patent: 4256587 (1981-03-01), Carnahan et al.
patent: 4530765 (1985-07-01), Sabherwal
patent: 4645605 (1987-02-01), Durham
patent: 4971920 (1990-11-01), Miyashita et al.
patent: 4980300 (1990-12-01), Miyashita et al.
patent: 5078900 (1992-01-01), Wegner
Article--"Silicon Defects and their effect on integrated circuits", J. M. Matlock, Mostek, Carrollton, Tex., pp. 3-28, Date Unknown Websters II New Riverside University Dictionary, Copyright 1984 by Haughton Mifflin Company, Boston, Mass., p. 529.

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