Apparatus and method for rapid thermal processing (RTP) of a plu

Details Apparatus and method for rapid thermal processing (RTP) of a plu Apparatus and method for rapid thermal processing (RTP) of a plu

1997-04-11

2000-04-18

Monin, Jr., Donald L.

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

438799, 219390, 219405, 118725, H03L 21324

Patent

active

060515120

ABSTRACT:
A plurality of substrates is closely stacked together in a Rapid Thermal Processing (RTP) chamber, and the stack is processed simultaneously.

REFERENCES:
patent: 5445676 (1995-08-01), Takagi
patent: 5710407 (1998-01-01), Moore et al.

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