Apparatus and method for providing a confined liquid for...

Details Apparatus and method for providing a confined liquid for... Apparatus and method for providing a confined liquid for...

2004-04-28

2008-05-06

Perrin, Joseph L. (Department: 1792)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S099100, C134S11500R, C134S902000, C355S030000

Reexamination Certificate

active

07367345

ABSTRACT:
A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.

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