Fluent material handling – with receiver or receiver coacting mea – Processes – With material treatment
Reexamination Certificate
2008-07-15
2008-07-15
Maust, Timothy L (Department: 3751)
Fluent material handling, with receiver or receiver coacting mea
Processes
With material treatment
C141S066000, C141S069000, C141S089000, C141S098000, C414S217100, C414S940000
Reexamination Certificate
active
11292674
ABSTRACT:
An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.
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Chae Hee-Sun
Cho Hyun-Ho
Jung Jae-Hyung
Lee Kun-Hyung
Lee Soo-Woong
Maust Timothy L
Mills & Onello LLP
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