Apparatus and method for preventing the premature mixture of rea

Details Apparatus and method for preventing the premature mixture of rea Apparatus and method for preventing the premature mixture of rea

1997-09-30

2000-12-19

Mills, Gregory

Coating apparatus

Gas or vapor deposition

With treating means

118723E, 118725, 118724, 118723I, C23C 1601

Patent

active

061615005

ABSTRACT:
A method and apparatus for depositing a film by chemical vapor deposition comprises a showerhead for dispersing reactant gases into the processing space wherein the showerhead has a first space therein operable for receiving and dispersing the first reacting gas, and has a second space therein, generally isolated from the first space, and operable for receiving and dispersing the second reactant gas separate from the first gas dispersion for maintaining segregation of reactant gases and generally preventing premature mixture of the gases prior to their introduction into the processing space to prevent premature deposition in the system.

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