Apparatus and method for plasma treatment of substrates

Details Apparatus and method for plasma treatment of substrates Apparatus and method for plasma treatment of substrates

1985-12-04

1988-03-01

Chatmon, Saxfield

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

315 39, 31511151, 118729, 118 501, 42218605, H01J 724, H05B 3126

Patent

active

047288639

ABSTRACT:
An apparatus for substantially uniformly treating a substrate with a microwave plasma consists of a mechanism for simultaneously moving the substrate in two directions relative to the direction of plasma production. In one embodiment, the substrate is simultaneously moved rotationally and translationally. In a second embodiment, the substrate is subjected to planetary motion.

REFERENCES:
patent: 3814983 (1974-06-01), Weissfloch et al.
patent: 3911318 (1975-10-01), Spero et al.
patent: 4521717 (1985-06-01), Kieser
patent: 4548699 (1985-10-01), Hutchinson et al.
patent: 4583488 (1986-04-01), Brown, Jr. et al.
patent: 4630563 (1986-12-01), Kieser
patent: 4630566 (1986-12-01), Asmussen et al.

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