Apparatus and method for pattern inspection

Details Apparatus and method for pattern inspection Apparatus and method for pattern inspection

2011-07-05

2011-07-05

Pham, Hoa Q (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

C356S237400

Reexamination Certificate

active

07973918

ABSTRACT:
A pattern inspection apparatus includes a pulsed light source configured to emit pulsed light; a stage configured to mount thereon an inspection target object with a pattern formed thereon; a time delay integration (TDI) sensor configured to detect, a plurality of times with a time delay, each pixel value of an optical image of the inspection target object, wherein the optical image is acquired by emitting the pulsed light onto the inspection target object, and to integrate a detected each pixel value for each pixel of the optical image; a light quantity sensor configured to detect a light quantity of the pulsed light after emitting the pulsed light onto the inspection target object; a light quantity measurement circuit configured to input the light quantity detected by the light quantity sensor, and to measure a light quantity of each pulse while being synchronized with a period of the pulsed light; a correction unit configured to input the light quantity of each pulse and an integrated pixel value output from the TDI sensor, and to correct the integrated pixel value output from the TDI sensor, for each pixel of the optical image, using a total light quantity of the light quantity of corresponding each pulse; and an inspection unit configured to inspect whether there is a defect of the pattern, using the integrated pixel value corrected.

REFERENCES:
patent: 6654110 (2003-11-01), Yonezawa et al.
patent: 7781749 (2010-08-01), Imai
patent: 2003/0081201 (2003-05-01), Shibata et al.
patent: 2004/0108448 (2004-06-01), Bosser
patent: 2005/0196059 (2005-09-01), Inoue et al.
patent: 2007/0053583 (2007-03-01), Harabe
patent: 2009/0040513 (2009-02-01), Abe et al.
patent: 2009/0087082 (2009-04-01), Abe et al.
patent: 05-076005 (1993-03-01), None
patent: 2004-101438 (2004-04-01), None
patent: 2007093317 (2007-04-01), None

Affiliated with

Also associated with

Rating

Apparatus and method for pattern inspection does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for pattern inspection, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for pattern inspection will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2634766