Apparatus and method for particle sampling during semiconductor

Measuring and testing – Sampler – sample handling – etc. – Capture device

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7386302, G01N 122

Patent

active

061195324

ABSTRACT:
An apparatus for sampling particles from a processing chamber used in the fabrication of semiconductor devices includes a sampling line sequentially having a sampling port, a sampling air valve, a particle sampler and an isolation valve. A pumping line is connected between the isolation valve and a pump, and a discharge line is connected between the pump and a discharge port. The apparatus includes a purge line sequentially having a purge gas source, a purge air valve, and a divergence end. A purge-sampler line connects the divergence end to the sampling line between the sampling air valve and the particle sampler, and includes a purge-sampler air valve. A purge-pump line connects the divergence end to the pumping line, and includes a purge-pump air valve. The apparatus also includes an isolation valve bypass line connected at one end to the sampling line between the particle sampler and the isolation valve, connected at the other end to the pumping line between the isolation valve and the purge-pump line, and including a bypass air valve. A control unit controls the operation of the isolation valve, the pump, and the air valves.

REFERENCES:
patent: 3973848 (1976-08-01), Jowett et al.
patent: 4101282 (1978-07-01), Ririe
patent: 5458010 (1995-10-01), Tucina et al.
patent: 5760314 (1998-06-01), Bromberg et al.
patent: 5827744 (1998-10-01), Fose et al.

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