Apparatus and method for particle monitoring in immersion...

Details Apparatus and method for particle monitoring in immersion... Apparatus and method for particle monitoring in immersion...

2006-05-17

2009-10-13

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

Reexamination Certificate

active

07602471

ABSTRACT:
The present disclosure provides an immersion lithography system. The system includes an imaging lens having a front surface; a substrate stage positioned underlying the front surface of the imaging lens; an immersion fluid retaining structure having a fluid inlet and a fluid outlet, configured to hold a fluid from the fluid inlet, at least partially filling a space between the front surface and a substrate on the substrate stage, and flowing the fluid out through the fluid outlet; and a particle monitor module integrated with the immersion fluid retaining structure.

REFERENCES:
patent: 5610683 (1997-03-01), Takahashi
patent: 7317504 (2008-01-01), De Smit et al.
patent: 2006/0050351 (2006-03-01), Higashiki
patent: 2007/0252960 (2007-11-01), Kida
patent: 2007/0291239 (2007-12-01), Shiraishi
patent: WO 2005/122218 (2005-12-01), None

Affiliated with

Also associated with

Rating

Apparatus and method for particle monitoring in immersion... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for particle monitoring in immersion..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for particle monitoring in immersion... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4140016