Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1991-08-16
1993-03-16
Nguyen, Nam X.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429818, 20429819, 2042982, C23C 1434
Patent
active
051941317
ABSTRACT:
A source for sputtering from concentric rings on the surface of a single target is shown. The source comprises a rotatable closed-loop magnet having a plurality of curved sections of different average radius interconnected by a equal number of radial sections. In the preferred embodiment the curved sections each have a shape which results in a predetermined erosion profile in the associated concentric ring of the sputter target. The relative rate of sputtering from each of the rings may be controlled by adjusting the relative lengths of the curved portions of the closed-loop magnet.
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Nguyen Nam X.
Varian Associates Inc.
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