Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2008-05-13
2008-05-13
Lee, Hwa (Andrew) (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S632000
Reexamination Certificate
active
07372579
ABSTRACT:
An apparatus for monitoring a trench profile of a substrate includes a radiation-emitting unit for irradiating the substrate with infrared radiation. The intensity and/or polarization state of the infrared radiation reflected from the substrate is measured at a multitude of measuring frequencies. An analyzing unit determines the respective reflectance and relative phase change and/or relative amplitude change in relation to the respective measuring frequency. In addition, a reflectance spectrum, a relative phase change spectrum and/or a relative amplitude change spectrum may be obtained. By performing a Fourier transformation of the respective spectrum, a secondary Fourier spectrum is obtained. The secondary Fourier spectrum plots a virtual amplitude against corresponding values of a frequency periodicity that correspond to a substrate depth. Peaks of the virtual amplitude may indicate reflective planes within the substrate at respective depths. Thus, rough sections in the trench profile may be identified without modeling.
REFERENCES:
patent: 6275297 (2001-08-01), Zalicki
patent: 6801321 (2004-10-01), Du-Nour
patent: 7019844 (2006-03-01), Venugopal et al.
Chen Zhen-Long
Guittet Pierre-Yves
Kasic Alexander
Klee Anita
Schmidt Barbara
Edell Shapiro & Finnan LLC
Infineon - Technologies AG
Lee Hwa (Andrew)
Nanya Technology Corporation
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