Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2007-06-12
2007-06-12
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
Reexamination Certificate
active
10858587
ABSTRACT:
A method for measuring overlay in a sample includes obtaining an image of an overlay target that includes a series of grating stacks each having an upper and lower grating, each grating stack having a unique offset between its upper and lower grating. The image is obtained with a set of illumination and collection optics where the numerical aperture of the collection optics is larger than the numerical aperture of the illumination optics and with the numerical apertures of the illumination and collection optics are selected so that the unit cells of gratings are not resolved, the grating stacks are resolved and they appear to have a uniform color within the image of the overlay target.
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Huang Hsu-Ting
Sezginer Abdurrahman
Shinagawa Robert
Stallman & Pollock LLP
Stock, Jr. Gordon J.
Toatley , Jr. Gregory J.
Tokyo Electron Limited
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