Apparatus and method for limiting double exposure in stepper

Details Apparatus and method for limiting double exposure in stepper Apparatus and method for limiting double exposure in stepper

1997-12-12

1999-08-03

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2772, G03B 2742

Patent

active

059332204

ABSTRACT:
An apparatus and method for limiting double exposure in a stepper with a shutter that alternately passes and blocks a light beam for fabrication of semiconductor devices. The apparatus has a light sensor that detects light passed by the shutter and produces a sensing signal related to the light passed. A double exposure detector receives the sensing signal and produces an error signal related to the sensing signal. An exposure controller connected to the detector and connected to the shutter, receives the error signal and produces a shutter-driving control signal.

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patent: 5777744 (1998-07-01), Yoshii et al.

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