Apparatus and method for large area chemical vapor...

Details Apparatus and method for large area chemical vapor... Apparatus and method for large area chemical vapor...

2005-03-29

2005-03-29

Meeks, Timothy (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

C427S579000, C427S580000, C427S255370, C427S255500

Reexamination Certificate

active

06872428

ABSTRACT:
Chemical vapor deposition is performed using a plurality of expanding thermal plasma generating means to produce a coating on a substrate, such as a thermoplastic and especially a polycarbonate substrate. The substrate is preferably moved past the generating means. Included are methods which coat both sides of the substrate or which employ multiple sets of generating means, either in a single deposition chamber or in a plurality of chambers for deposition of successive coatings. The substrate surfaces spaced from the axes of the generating means are preferably heated to promote coating uniformity.

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patent: 5985378 (1999-11-01), Paquet
patent: 6110544 (2000-08-01), Yang et al.
patent: 887110 (1998-12-01), None

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