Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-07-27
1996-06-25
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419211, 20429804, 20429836, C23C 1434
Patent
active
055296718
ABSTRACT:
The invention uses an ion beam to polish a rotatable substrate from an oblique angle between the horizontal and the center line of the gun to the substrate to upgrade the quality of substrates. Alternatively, the substrates are left in the high vacuum chamber without breaking the vacuum for in-situ deposition of thin films thereby avoiding contamination, and to provide premium optics. A wobble stick arrangement is provided to align the ellipsometer reflected beam with the ellipsometer detector during operation without breaking the vacuum which, if broken, would admit contamination.
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patent: 4481062 (1984-11-01), Kaufman et al.
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patent: 4793908 (1988-12-01), Scott et al.
patent: 4816133 (1989-03-01), Barnett
Debley William P.
Larson John G.
Caldwell Wilfred G.
Kirk James F.
Litton Systems Inc.
Martine Chester E.
Nguyen Nam
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