Apparatus and method for ion beam polishing and for in-situ elli

Details Apparatus and method for ion beam polishing and for in-situ elli Apparatus and method for ion beam polishing and for in-situ elli

1994-07-27

1996-06-25

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419211, 20429804, 20429836, C23C 1434

Patent

active

055296718

ABSTRACT:
The invention uses an ion beam to polish a rotatable substrate from an oblique angle between the horizontal and the center line of the gun to the substrate to upgrade the quality of substrates. Alternatively, the substrates are left in the high vacuum chamber without breaking the vacuum for in-situ deposition of thin films thereby avoiding contamination, and to provide premium optics. A wobble stick arrangement is provided to align the ellipsometer reflected beam with the ellipsometer detector during operation without breaking the vacuum which, if broken, would admit contamination.

REFERENCES:
patent: 4142958 (1979-03-01), Wei et al.
patent: 4419202 (1983-12-01), Harper et al.
patent: 4481062 (1984-11-01), Kaufman et al.
patent: 4684848 (1987-08-01), Kaufman et al.
patent: 4793908 (1988-12-01), Scott et al.
patent: 4816133 (1989-03-01), Barnett

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