Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2006-09-21
2009-12-01
Nguyen, Sang (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
C356S237500, C356S394000, C382S149000, C382S154000
Reexamination Certificate
active
07626691
ABSTRACT:
An apparatus for inspecting overlay patterns includes an optical module which projects a plurality of neighboring overlay patterns formed on a wafer. The apparatus also includes a pickup unit which obtains a plurality of image signals corresponding to the plurality of overlay patterns projected from the optical module. The apparatus also includes a comparison unit configured to generate a plurality of images including the plurality of overlay patterns from the image signals obtained at the pickup unit, compare an overlay pattern image corresponding to any one of the plurality of overlay patterns with a previously input overlay pattern image, and based on the comparison, extract at least a portion of the overlay pattern image identical or similar to the previously input overlay pattern image. The apparatus also includes a restoration unit which restores the partially extracted overlay pattern image in accordance with a predetermined overlay pattern. The apparatus also includes a readout unit which calculates and compares a position of the restored overlay pattern image with a position of an overlay pattern image not compared by the comparison unit, and which reads out a deviation between the two positions.
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Nguyen Sang
Samsung Electronics Co,. Ltd.
Volentine & Whitt PLLC
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