Apparatus and method for in-situ generation of dangerous polyato

Details Apparatus and method for in-situ generation of dangerous polyato Apparatus and method for in-situ generation of dangerous polyato

1989-02-28

1990-08-28

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20429804, 20429813, 20429807, 20429826, 31511121, 31511171, 31511181, 31511191, 250424, 250425, C23C 1400

Patent

active

049522949

ABSTRACT:
In-situ generation of dangerous polyatomic gases is achieved by providing a solid elemental or compound source, one or more gaseous feedstock sources, a plasma generated in a partial vacuum, and beam impingement on the target to rapidly evolve the elemental species of interest. The toxic, corrosive, and explosive gas so generated in-situ can be better handled safely with lower operating cost.

REFERENCES:
patent: 3856654 (1974-12-01), George
patent: 3895602 (1975-07-01), Bobenrieth
patent: 4492620 (1985-01-01), Matsuo et al.
patent: 4664769 (1987-05-01), Cuomo
patent: 4680507 (1987-07-01), Uemura et al.
Potts et al., "Laser Induced Evaporation"; IBM Technical Disclosure Bulletin, Jul. 2, 1965, vol. 8, No. 2, p. 285.

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