Apparatus and method for in-situ adjustment of light transmissio

Photocopying – Projection printing and copying cameras – Step and repeat

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355 71, 362 19, G03B 2742, G03B 2772, F21V 914

Patent

active

061633674

ABSTRACT:
An adjustable, in-situ photolithography process is taught, where incident exposure light is passed through two polarizers; the first polarizer capable of altering its polarization direction, during exposure, relative to the polarization direction of the second polarizer, in order to enhance the contrast of a patterned image projected on a semiconductor wafer. The second polarizer in the optical train is a photo mask transparent substrate impregnated with colloidal crystals that are aligned in a fixed, predetermined direction by magnetic field. The photo mask may also contain a silicon compound for phase shifting the incident exposure light to further enhance the image contrast.

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