Apparatus and method for heating substrates

Heating – Work feeding – agitating – discharging or conveying... – Removable furnace bottom section or kiln cart

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C432S207000, C432S247000, C118S725000, C219S390000, C414S939000

Reexamination Certificate

active

07431585

ABSTRACT:
An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while substrates in the stacked cell structures are being heated.

REFERENCES:
patent: 2897772 (1959-08-01), Hunter
patent: 5201653 (1993-04-01), Hasegawa et al.
patent: 5515986 (1996-05-01), Turlot et al.
patent: 5772386 (1998-06-01), Mages et al.
patent: 5897311 (1999-04-01), Nishi
patent: 5915957 (1999-06-01), Tanigawa
patent: 6164961 (2000-12-01), Luscher et al.
patent: 6246031 (2001-06-01), Yoo
patent: 6271459 (2001-08-01), Yoo
patent: 6364954 (2002-04-01), Umotoy et al.
patent: 6390754 (2002-05-01), Yamaga et al.
patent: 6402849 (2002-06-01), Kwag et al.
patent: 6448537 (2002-09-01), Nering
patent: 6511315 (2003-01-01), Hashimoto
patent: 6544035 (2003-04-01), Tsuru
patent: 6572371 (2003-06-01), Sion et al.
patent: 6825447 (2004-11-01), Kim et al.
patent: 2001/0016307 (2001-08-01), Ishii
patent: 2003/0194299 (2003-10-01), Yoo
patent: 2005/0188923 (2005-09-01), Cook et al.
patent: 2006/0245852 (2006-11-01), Iwabuchi
patent: WO 00/36179 (2000-06-01), None
Yoo et al., “Low-temperature annealing system for 300mm thermal processing,” Solid State Technology, Jun. 2001, pp. 152-160.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for heating substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for heating substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for heating substrates will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4001134

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.