Apparatus and method for generating transistor model

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C716S030000, C716S030000, C716S030000, C703S014000

Reexamination Certificate

active

07451430

ABSTRACT:
In a transistor model generating apparatus, a transistor region extracting section extracts a non-rectangular transistor region, in which a gate region is formed above a non-rectangular diffusion layer region, from a mask layout data of a semiconductor integrated circuit. A dividing section sets a division line extending in a direction of a gate length of a transistor to divide the non-rectangular transistor region into a plurality of rectangular transistor regions. A relating section relates the non-rectangular transistor region and the plurality of rectangular transistor regions with the mask layout data. A size calculating section calculates a size data of each of the plurality of rectangular transistor regions. A correction value calculating section calculates a correction value of a diffusion layer length dependency parameter to the plurality of rectangular transistor regions based on the size data. A transistor model registering section registers a transistor model of the transistor for a circuit simulation based on the diffusion layer length dependency parameter and the correction value.

REFERENCES:
patent: 7049589 (2006-05-01), Yamaguchi et al.
patent: 10-162047 (1998-06-01), None
patent: 2004-119608 (2004-04-01), None

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