Apparatus and method for fluid processing of electronic packagin

Details Apparatus and method for fluid processing of electronic packagin Apparatus and method for fluid processing of electronic packagin

1994-01-25

1995-07-25

Powell, William

Etching a substrate: processes

Nongaseous phase etching of substrate

Projecting etchant against a moving substrate or controlling...

156345, 134 34, 134 64R, 134122R, 134198, B44C 122

Patent

active

054358850

ABSTRACT:
A fluid treatment apparatus including a first fluid flow manifold having at least one fluid head positioned on a first side of a surface of a substrate to be treated by a fluid. The first fluid flow manifold includes at least two sets of a plurality of fluid jet injectors formed therein and apparatus for directing a fluid into the fluid jet injectors. Each of the fluid jet injectors creates a fluid jet impinging upon the surface of the substrate. Apparatus is interconnected with the first fluid flow manifold for supplying fluid to the fluid injector jets. Apparatus connected between the supply apparatus and the first fluid flow manifold alternates a flow of the fluid through the sets of fluid jet injectors. A fluid source is connected to the fluid supplying apparatus.

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patent: 5310440 (1994-05-01), Zingher

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