Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1992-01-17
1993-08-24
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156651, 156655, 1566591, 156345, 156662, 2191216, 21912169, 372 50, H01L 21306, B44C 122
Patent
active
052385310
ABSTRACT:
An apparatus 10 for exposing a chirped grating pattern of monochromatic light on a photoresist coated semiconductor wafer 12 includes an argon gas laser 14 that outputs a monochromatic light beam 16. This monochromatic light beam 16 is filtered and collimated to produce a monochromatic light beam with a planar wavefront 24. A portion of this planar wavefront passes through a cylindrical lens 26 and a first baffle slit 30, producing a cylindrical wavefront 34 that is incident upon a hypotenuse face 38 of a right angle prism 40. Another portion of the planar wavefront passes through a second baffle slit 32, producing a smaller planar wavefront 36 that is also incident upon the hypotenuse face 38 of the right angle prism 40. A destructive interference between a reflected cylindrical wavefront 92 and a direct planar wavefront 90 inside the prism 40 produces a chirped grating pattern of monochromatic light on an adjacent prism face 42. This chirped grating pattern of monochromatic light is projected toward the semiconductor wafer 12, thereby exposing the photoresist coated wafer surface 48 with the chirped grating pattern.
REFERENCES:
patent: 4701995 (1987-10-01), Dolan et al.
patent: 4777148 (1988-10-01), Liau et al.
patent: 4838987 (1989-06-01), Dobson
Macomber Steven H.
Mott Jeffrey S.
Denson-Low Wanda K.
Hughes Aircraft Company
Powell William A.
Sales Michael W.
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