Radiant energy – Means to align or position an object relative to a source or...
Reexamination Certificate
2006-03-21
2006-03-21
Nguyen, Kiet T. (Department: 2881)
Radiant energy
Means to align or position an object relative to a source or...
C250S492220
Reexamination Certificate
active
07015487
ABSTRACT:
A projection apparatus for imaging a pattern of a mask onto a substrate by means of a beam of projected charged particles is disclosed. The apparatus includes a radiation sensitive layer. The apparatus also includes a mask. The mask includes a membrane layer made of a first material, scattering regions forming the pattern and made of a second material scattering the charged particles more than the membrane layer, and a plurality of straightly extending supporting struts spaced apart from one another and supporting the membrane layer together with the scattering regions. The apparatus also includes a projection apparatus. The projection apparatus includes a beam shaping device for producing the projection beam with a predetermined projection beam cross-section in the mask plane, and a positioning device for moving the projection beam cross-section in the mask plane along a predetermined path over the mask parallel to the direction into which the struts extend. The apparatus also includes a sensor for supplying a measuring signal which is dependent on the number of charged particles impinging on a mark region provided on the mask.
REFERENCES:
patent: 4521711 (1985-06-01), Okamoto et al.
patent: 4736172 (1988-04-01), Ebneter
patent: 4910839 (1990-03-01), Wright
patent: 4967088 (1990-10-01), Stengl et al.
patent: 5073763 (1991-12-01), Wright
patent: 5079112 (1992-01-01), Berger et al.
patent: 5130213 (1992-07-01), Berger et al.
patent: 5162689 (1992-11-01), Fliegel et al.
patent: 5258246 (1993-11-01), Berger et al.
patent: 5260151 (1993-11-01), Berger et al.
patent: 5264751 (1993-11-01), Dufilie et al.
patent: 5287036 (1994-02-01), Penunuri
patent: 5316879 (1994-05-01), Berger et al.
patent: 5327039 (1994-07-01), Yamada
patent: 5334960 (1994-08-01), Penunuri
patent: 5353206 (1994-10-01), Fejes
patent: 5376505 (1994-12-01), Berger et al.
patent: 5406159 (1995-04-01), Wright
patent: 5646584 (1997-07-01), Kondratyev et al.
patent: 5648188 (1997-07-01), Doran
patent: 5650629 (1997-07-01), Levi
patent: 5773911 (1998-06-01), Tanaka et al.
patent: 5906902 (1999-05-01), Farrow
patent: 5973826 (1999-10-01), Chapman et al.
patent: 5985493 (1999-11-01), Liddle et al.
patent: 6033079 (2000-03-01), Hudyma
patent: 6040095 (2000-03-01), Enichen et al.
patent: 6142641 (2000-11-01), Cohen et al.
patent: 6147574 (2000-11-01), Kidoh
patent: 6204509 (2001-03-01), Yahiro et al.
patent: 0 953 876 (1999-11-01), None
patent: 0 969 326 (2000-01-01), None
J. A Liddle, et al.; “SCALPEL: A Projection Electron-Beam Approach To Sub-Optical Lithography”; 71 pages; Technology Review, Dec. 1999.
ESRF Annual Report for 1995/1996 located at http:www.esrf.fr/info/science/annrep/95-96/report/exp/id32/id32.htm, 9 pgs.
Patent Abstracts of Japan, Publication No. 11142121, Publicate Date May 28, 1999, 1 page.
European Search Report date Dec. 16, 2003 (2 pages).
R.C. Farrow et al.; “Marks for Alignment and Registration in Projection Electron Lithography”; Journal of Vacuum Science & Technology B; vol. 11, No. 6, Nov./Dec. 1993; pp. 2175-2178.
Kienzle Oliver
Orchowski Alexander
Carl Zeiss SMT AG
Nguyen Kiet T.
Osha & Liang LLP
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