Apparatus and method for evaluating semiconductor material

Details Apparatus and method for evaluating semiconductor material Apparatus and method for evaluating semiconductor material

2006-12-05

2006-12-05

Pham, Hoa Q. (Department: 2877)

Optics: measuring and testing

For light transmission or absorption

C356S445000

Reexamination Certificate

active

07145658

ABSTRACT:
An apparatus for evaluating semiconductor material having a pump laser configured to irradiate a pump beam modulated at a modulation frequency on a semiconductor wafer, a probe laser configured to irradiate a probe beam on the semiconductor wafer, and a detector configured to detect a reflection of the probe beam from the semiconductor wafer.

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First Notification of Reason for Refusal issued by Talwanese Patent Office, mailed Apr. 25, 2005, in Taiwanese Application No. 093109303, and English-language translation thereof.
Notice of Grounds for Rejection issued by the Japanese Patent Office mailed Apr. 18, 2006, for Japanese Patent Application No. 2003-100442, and English-language translation thereof.

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