Apparatus and method for enhancing voltage contrast of a wafer

Details Apparatus and method for enhancing voltage contrast of a wafer Apparatus and method for enhancing voltage contrast of a wafer

2011-08-09

2011-08-09

Kim, Robert (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

C250S307000, C250S492100

Reexamination Certificate

active

07994476

ABSTRACT:
A system for electrically testing a semiconductor wafer, the system including (a) at least one charged particle beam focus effecting component and (b) at least one detector adapted to collect charged particles scattered from the wafer; wherein the system is adapted to scan a first area of a sample by a de-focused charged particle beam so as to affect a charging of the first area, scan at least a portion of the first area by a focused charged particle beam and detect electrons scattered from the at least portion. The system scans the at least portion while the first area remains affected by the de-focused charged particle beam. A method for electrically testing a semiconductor wafer includes scanning a first area of a sample by a de-focused charged particle beam so as to affect a charging of the first area; and scanning at least a portion of the first area by a focused charged particle beam while detecting electrons scattered from the at least portion, the at least portion being scanned while the first area remains affected by charging introduced by the de-focused charged particle beam.

REFERENCES:
patent: 6211518 (2001-04-01), Richardson et al.
patent: 7253410 (2007-08-01), Bertsche et al.
patent: 7560939 (2009-07-01), De et al.
patent: 2006/0289800 (2006-12-01), Murrell et al.

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