Apparatus and method for enhanced voltage contrast analysis

Details Apparatus and method for enhanced voltage contrast analysis Apparatus and method for enhanced voltage contrast analysis

2005-05-31

2005-05-31

Thompson, Craig A. (Department: 2813)

Semiconductor device manufacturing: process

With measuring or testing

Electrical characteristic sensed

C438S014000, C324S512000, C324S522000, C324S765010

Reexamination Certificate

active

06900065

ABSTRACT:
An apparatus and a method for electrically testing a semiconductor wafer, the method including: (i) depositing electrical charges at certain points of a test pattern; (ii) scanning at least a portion of the test pattern such as to enhance charge differences resulting from defects; and (iii) collecting charged particles emitted from the at least scanned portion as a result of the scanning, thus providing an indication about an electrical state of the respective test structure.

REFERENCES:
patent: 6448099 (2002-09-01), Iacoponi et al.
patent: 6544802 (2003-04-01), Jun et al.

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