Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element
Reexamination Certificate
2005-07-05
2005-07-05
Tang, Minh N. (Department: 2829)
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
Of individual circuit component or element
C324S754120
Reexamination Certificate
active
06914443
ABSTRACT:
A system and method is provided for testing the resistance of a test wafer having multiple conductors. Embodiments include a method having the steps of providing a signal that is substantially larger than a signal threshold to a test structure; and scanning at least two conductors of the test structure, that are electrically couplet to each other, by a limited voltage resolution SEM. Charged particles emitted from the at least two conductors as a result of the scanning are collected, thus providing an indication about a resistance of the at least two conductors.
REFERENCES:
patent: 3796947 (1974-03-01), Harrod et al.
patent: 4417203 (1983-11-01), Pfeiffer et al.
patent: 4837506 (1989-06-01), Patterson
patent: 5523694 (1996-06-01), Cole, Jr.
patent: 5959459 (1999-09-01), Satya et al.
patent: 6320396 (2001-11-01), Nikawa
patent: 6445199 (2002-09-01), Satya et al.
patent: 6448099 (2002-09-01), Iacoponi et al.
patent: 6449749 (2002-09-01), Stine
patent: 6475871 (2002-11-01), Stine et al.
Litman Alon
Talbot Chris
Applied Materials Israel, Ltd.
McDermott & Will & Emery
Tang Minh N.
LandOfFree
Apparatus and method for enhanced voltage contrast analysis does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for enhanced voltage contrast analysis, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for enhanced voltage contrast analysis will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3416197