Apparatus and method for endpoint detection in non-ionizing gase

Optics: measuring and testing – With plural diverse test or art

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356311, 356316, 216 60, 438 16, G01N 2168, G01N 2162

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active

059867477

ABSTRACT:
An apparatus and method for controlling a semiconductor fabrication process. The method comprises sampling a byproduct of a semiconductor fabrication process, isolating the sample from the process, exciting the sample to produce radiation and analyzing the radiation. A small evacuated analysis chamber is added to a process chamber to sample byproducts of a reaction taking place in the main chamber. Energy supplied by an excitation source excites the byproducts in the analysis chamber to produce radiation. Preferably the byproducts are ionized by a RF energy to produce a discharge in the analysis chamber. Radiation from the discharge, in the form of IR, UV or visible light, is analyzed by a conventional optical techniques such as OES. The method and apparatus enable optical endpoint detection for normally non-ionized gaseous interactions.

REFERENCES:
patent: 4675072 (1987-06-01), Bennett et al.
patent: 4853277 (1989-08-01), Barna et al.
patent: 4857136 (1989-08-01), Zajac
patent: 5288367 (1994-02-01), Angell et al.
patent: 5290383 (1994-03-01), Koshimizu
patent: 5308414 (1994-05-01), O'Neill et al.

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