Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1984-09-17
1992-08-11
Russel, Jeffrey Edwin
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
2041573, 423240R, 423241, 423DIG8, 423DIG10, 423240S, B01D 5334
Patent
active
051377012
ABSTRACT:
An apparatus and method for eliminating unwanted materials, such as corrosive gases, from an effluent gas flow line includes a reactive trap wherein chemical reaction between the unwanted material, a reactant gas and a reactive element takes place under induced plasma conditions. A ballast gas may be added to adjust operating pressures and to aid in creating the plasma. The reactant gas and the reactive element are selected so that relative harmless by-products are produced. The reactive element is preferably maintained at a temperature of approximately 400.degree. C. and the chemical by-products are passed through a condensation element in the reactive trap which element is maintained at approximately 30.degree. C. Preferably, the plasma is induced by a microwave transmitter in conjunction with a waveguide inserted into a reactive trap, and a control system automatically monitors and adjusts the temperature and pressure of the reaction as well as controls the ratio of effluent gas and ballast gas.
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Basic Chemistry and Mechanisms of Plasma Etching. Flamm et al. J. Vac. Sci. Technol, Jan.-Mar. 1983, pp. 23-30.
Martin Timothy J.
Russel Jeffrey Edwin
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