Apparatus and method for effecting exposure of sample to charged

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250396R, 250397, 2504922, 2504923, G06F 1520

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active

051723310

ABSTRACT:
An apparatus includes an optical unit for effecting an exposure of a sample to a charged particle beam and a control unit for effecting a deflection control of the charged particle beam. The control unit calculates a basic waveform based on the scanning of a beam having a constant width on a mark pattern, divides a cross section of a selective block pattern into portions by the constant width, calculates respective waveforms based on the scanning of only a beam of each portion using the basic waveform, and sequentially displaces the calculated waveforms with units of the constant width and overlaps the displaced waveforms to determine a forecast waveform. The control unit calculates a compensated deflection data based on a comparison of the forecast waveform and a waveform measured in the actual scanning of the selective block pattern and deflects a beam based on the calculated data to project the beam on the sample. As a result, it is possible to precisely determine a position of application of the beam to the sample irrespective of geometrical conditions of the selective block pattern and thus effect the exposure with high precision.

REFERENCES:
patent: 4443704 (1984-04-01), Yamashita et al.
patent: 4489241 (1984-12-01), Matsuda et al.
patent: 4789945 (1988-12-01), Nijima
patent: 4807159 (1989-02-01), Komatsu et al.
patent: 4897552 (1990-01-01), Okunuki et al.
patent: 5047646 (1991-09-01), Hattori et al.

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