Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Layout generation
Reexamination Certificate
2011-07-19
2011-07-19
Levin, Naum (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Layout generation
C716S051000, C430S005000, C438S183000
Reexamination Certificate
active
07984396
ABSTRACT:
The EB data is separated into an area A and other area. The area A is covered by a recognition layer to which an algorism is linked to form a recognition layer A. For arranging a same dummy pattern for respective areas A, a dummy pattern creation starting point is designated in a common position for each recognition layer A. When there are areas A which have different rotation angles, the recognition layer is created to satisfy a condition that, even if any corner of the area A is designated as the dummy pattern creation starting point, the created dummy pattern becomes an identical arrangement. The sizes DP and gaps GAP of the dummy pattern elements composing the dummy pattern are respectively same in X-direction and Y-direction. The size of the recognition layer A is determined by: a multiple of (DP+GAP)+DP, in X and Y-direction respectively.
REFERENCES:
patent: 5018210 (1991-05-01), Merryman et al.
patent: 5636133 (1997-06-01), Chesebro et al.
patent: 6080661 (2000-06-01), Bothra
patent: 6323113 (2001-11-01), Gabriel et al.
patent: 6901575 (2005-05-01), Wu et al.
patent: 7062732 (2006-06-01), Ito et al.
patent: 7261984 (2007-08-01), Ibusuki
patent: 7368737 (2008-05-01), Inanami et al.
patent: 7500219 (2009-03-01), Ogino et al.
patent: 7673270 (2010-03-01), Wang et al.
patent: 7772070 (2010-08-01), Kitajima et al.
patent: 2003/0204832 (2003-10-01), Matumoto
patent: 2005/0193364 (2005-09-01), Kotani et al.
patent: 2007/0023653 (2007-02-01), Toyoda et al.
patent: 2003-324149 (2003-11-01), None
Foley & Lardner LLP
Levin Naum
Renesas Electronics Corporation
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