Apparatus and method for drying substrates

Details Apparatus and method for drying substrates Apparatus and method for drying substrates

1993-12-22

1995-08-22

Gromada, Denise L.

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

34 75, 34 73, 34 78, 134105, F26B 300

Patent

active

054435404

ABSTRACT:
An apparatus for drying substrates such as wafers while contacting IPA vapor with them to remove that solution, which adheres to them when they are washed, includes a vessel in which IPA is stored, a unit for supplying the IPA into the vessel, a unit for draining the IPA from the vessel, heater block arranged contactable with the underside of the vessel to heat the IPA in the vessel by heat conduction, a boat elevator for positioning the substrates in a steam existing space in which steam generated from the heated process solution and a water cooling system arranged in the vessel to exchanged heat between the IPA and cooling water so as to cool the IPA, which is to be drained from the vessel, by the cooling water.

REFERENCES:
patent: 4348174 (1982-09-01), Spigarelli
patent: 4558524 (1985-12-01), Peck et al.
patent: 4679721 (1987-07-01), Kondo
patent: 4777970 (1988-10-01), Kusuhara
patent: 4841645 (1989-06-01), Bettcher et al.
patent: 5054210 (1991-10-01), Schumacher et al.

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