Apparatus and method for detecting impurities in wet chemicals

Details Apparatus and method for detecting impurities in wet chemicals Apparatus and method for detecting impurities in wet chemicals

1998-04-30

2000-11-14

Larkin, Daniel S.

Measuring and testing

Liquid analysis or analysis of the suspension of solids in a...

73 6141, G01N 27403, G01N 3300

Patent

active

061453722

ABSTRACT:
A apparatus and method for monitoring impurities in wet chemicals in semiconductor wafer processing comprising a silicon sensor (12) that is electrically connected to a potentiometer (22), a reference electrode (14) electrically connected to the potentiometer (22), wherein a comparison in the potential between the silicon sensor (12) and the reference electrode (14) to a predetermined baseline is used to measure wet chemical impurities, is disclosed.

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patent: 5395503 (1995-03-01), Parce et al.
patent: 5489515 (1996-02-01), Hatschek et al.
Chyan et al., "A New Potentiometric Sensor for the Detection of Trace Metallic Contaminants in Hydrofluoric Acid", J. Electrochem. Soc., vol. 143, No. 10, Oct. 1996, pp. L235-L237.

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