Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2006-09-26
2006-09-26
Alejandro-Mulero, Luz (Department: 1763)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C438S788000
Reexamination Certificate
active
07112352
ABSTRACT:
A method and apparatus for depositing a uniform coating on a large area, planar surface using an array of multiple plasma sources and a common reactant gas injector. The apparatus includes at least one array of a plurality of plasma sources, wherein each of the plurality of plasma sources includes a cathode, an anode, and an inlet for a non-reactive plasma source gas disposed in a plasma chamber, and a common reactant gas injector disposed in a deposition chamber that contains the substrate. The common reactant gas injector provides a uniform flow of at least one reactant gas to each of the multiple plasmas generated the multiple plasma sources through a single delivery system. The at least one reactant gas reacts with the plurality of plasmas to form a uniform coating on a substrate.
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Alejandro-Mulero Luz
Caruso Andrew J.
General Electric Company
Powell, III William E.
LandOfFree
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