Apparatus and method for depositing and planarizing thin...

Chemistry: electrical and wave energy – Apparatus – Electrolytic

Reexamination Certificate

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C204S275100, C204S280000, C204S297010, C205S147000

Reexamination Certificate

active

07153400

ABSTRACT:
An electroplating apparatus for depositing a metallic layer on a surface of a wafer is provided. In one example, a proximity head capable of being electrically charged as an anode is placed in close proximity to the surface of the wafer. A plating fluid is provided between the wafer and the proximity head to create localized metallic plating.

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