Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-01-31
1996-11-26
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118719, 118723ER, C23C 1600
Patent
active
055781306
ABSTRACT:
A plasma apparatus for forming a diamond-like carbon layer on a magnetic substance including a central columnar electrode; an outer electrode around the central electrode in a coaxial relation such that a discharge space is formed therebetween; a dielectric member located between the central electrode and the outer electrode; a device for introducing a reactive gas containing at least a carbon compound gas from one end of the discharge space; a device for applying a high frequency voltage between the central electrode and the outer electrode to form a plasma of the reactive gas; a device for flowing a shield gas to prevent the plasma from directly contacting ambient air; a substrate located in the vicinity of another end of the discharge space so that a carbon coating is formed on the substrate from the plasma.
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Hayashi Shigenori
Yamazaki Shunpei
Blanche Bradley D.
Breneman R. Bruce
Chang Joni Y.
Ferguson Jr. Gerald J.
Semiconductor Energy Laboratory Co,. Ltd.
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